Shape: | Discs |
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Application: | PVD Sputtering |
Transport Package: | Box |
Specification: | 100*40 |
Trademark: | FUTURE |
Origin: | China |
Samples: |
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Customization: |
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Factory directly sale plate type 3N5 purity Tantalum sputtering target
TA, a metallic element, mainly exists in tantalite and coexists with niobium. The hardness of tantalum is moderate [1], and it is malleable. It can be drawn into thin wires to make thin foil. The coefficient of thermal expansion is very small. Tantalum has excellent chemical properties and high corrosion resistance. and aqua regia under both cold and hot conditions. It can be used to make evaporators, electrodes, rectifiers and electrolytic capacitors of electronic tubes. Used medicinally to make thin sheets or threads to repair damaged tissue. Although the corrosion resistance of tantalum is very strong, its corrosion resistance is due to the formation of a stable protective film of tantalum pentoxide.
Item
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Tantalum
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Relative atomic mass
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180.9479
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Atomic number
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73
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Melting point
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2996°C
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Boiling point
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5425°C
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Density
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16.65g/cm3
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Method
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HIP/Melting
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Q:Can you make the product with my design?
A: Yes, we can,we supply customized service.You can send us all the details of what you need,then we will provide detailed quotation.
Q:What's the payment and the delivery time?
A: Payment<=1000 USD, 100% in advance. Payment>=1000 USD, 30% T/T in advance ,balance before shipment.Generally it is 5-7 days if the goods are in stock or it is 15-20 days if the goods are not in stock, it is according to quantity.
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A:Of course,you can contact us at any time. We promise our products are all qualified.If you find any products are not qualified and unsatisfied your require, please contact us at any time.
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