• Titanium Target for PVD High Purity 99.9% Titanium Sputtering Target
  • Titanium Target for PVD High Purity 99.9% Titanium Sputtering Target
  • Titanium Target for PVD High Purity 99.9% Titanium Sputtering Target
  • Titanium Target for PVD High Purity 99.9% Titanium Sputtering Target
  • Titanium Target for PVD High Purity 99.9% Titanium Sputtering Target
  • Titanium Target for PVD High Purity 99.9% Titanium Sputtering Target

Titanium Target for PVD High Purity 99.9% Titanium Sputtering Target

Type: Titanium Target
Application: Industrial, PVD
Technique: Forged
Grade: GR1
Shape: Round
Transport Package: Box
Customization:
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  • Overview
  • Product Description
  • FAQ
Overview

Basic Info.

Model NO.
FTS009
Specification
100*40 or customized
Trademark
FUTURE
Origin
China
Production Capacity
1000, 0/ Months

Product Description

  • Titanium Target for PVD High Purity 99.9% Titanium Sputtering TargetSputtering targets and arcing cathodes 

    our targets and cathodes made from 
  • Product Description

     

  • titanium-aluminumaluminumchromiumchromiumtitanium, zirconium, etc .
  • Drills, milling machines or indexable cutting inserts: Nitride and carbide titanium (Ti) and zirconium (Zr) coatings allow you to protect your tools against wear economically and reliably. In addition, zirconium is suitable for decorative coatings in brass-like colors, for example for operating elements on appliances and fittings.

    Titanium and zirconium coatings are applied using the reactive magnetron sputtering or the arc evaporation process. We supply both materials as sputtering targets and arc cathodes in all common sizes and formats.

  • Our targets and cathodes made from titanium-aluminum (TiAl) ensure that drills, milling machines, indexable cutting inserts and other tools are protected by a hard, oxidation-resistant nitride coating (TiAlN).

    Our materials are applied using either the reactive magnetron sputtering method or arc evaporation and form in a nitrogen atmosphere a nitride hard material layer on the substrate.

    Our TiAl targets are popular due to their:

    • High ductility

    • High thermal conductivity

    • Homogeneous microstructure

    • Unbeatable level of material purity

    Whatever the geometry - rotary or planar arc cathodes or planar sputtering targets: We can supply tailor-made targets that are perfect for your application.

    Contact us if you need to know more .

 Round Target

Material

Type

Size

Ti Target

Ni Target

Zr Target

Mo Target

Ti-Al Target

SSTarget

Round

Common:Dia100*40,Dia80*40,Dia60*40

According to Customers' Requirements  

 

Plate Target

Material

Type

Size

Ti Target      

Ni Target      

Zr Target      

Mo Target     

Ti-Al Target   

SS Target                

Plate

 According to Customers' Requirements 

FAQ

Q:Why choose US?
A:We are a professional manufacturer and have many years production and management experience.
 
Q:Can you make the product with my design?
A: Yes, we can,we supply customized service.You can send us all the details of what you need,then we will provide detailed quotation. 
 
Q:What's the payment and the delivery time?
A: Payment<=1000 USD, 100% in advance. Payment>=1000 USD, 30% T/T in advance ,balance before shipment.Generally it is 5-7 days if the goods are in stock or it is 15-20 days if the goods are not in stock, it is according to quantity.
 
Q:Do you have after-sales service?
A:Of course,you can contact us at any time. We promise our products are all qualified.If you find any products are not qualified and unsatisfied your require, please contact us at any time.
Titanium Target for PVD High Purity 99.9% Titanium Sputtering TargetTitanium Target for PVD High Purity 99.9% Titanium Sputtering Target

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Gold Member Since 2022

Suppliers with verified business licenses

Manufacturer/Factory
Number of Employees
25
Year of Establishment
2014-01-17